The Buffered Oxide Etch Market size is expected to grow at an annual average of 5% during 2021-2027. Buffered oxide etching (BOE), also known as buffered HF or BHF, is a wet etchant used for microfabrication. It is mainly used to etch silicon dioxide (SiO2) or silicon nitride (Si3N4) thin films. A mixture of buffers such as ammonium fluoride (NH4F) and hydrofluoric acid (HF). Concentrated HF (typically 49% HF in water) etches the silicon dioxide away so quickly that the process is well controlled and strips the photoresist used for lithographic patterning. Buffer oxide etching is typically used for more controllable etching.
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A full report of Buffered Oxide Etch Market is available at: https://www.orionmarketreports.com/buffered-oxide-etch-market/37859/
The following segmentation are covered in this report:
By Application
- Silica Etching
- Other
By Type
- Conventional Semiconductor Grade
- Fine Electronic Grade
- Ultra High Purity Grade
Company Profile
- Stella Chemifa
- Zhejiang Kaisn
- FDAC
- Zhejiang Morita
- Soulbrain
- KMG Chemicals
- Jiangyin Jianghua
- Suzhou Crystal Clear Chemical
- Fujian Shaowu Yongfei
- Suzhou Boyang Chemical
- Jiangyin Runma
- Puritan Products(Avantor)
- Columbus Chemical Industries
- Transene Company
The report covers the following objectives:
- Proliferation and maturation of trade in the global Buffered Oxide Etch Market
- The market share of the global Buffered Oxide Etch Market supply and demand ratio, growth revenue, supply chain analysis, and business overview.
- Current and future market trends that are influencing the growth opportunities and growth rate of the Buffered Oxide Etch Market
- Feasibility study, new market insights, company profiles, investment return, revenue (value), and consumption (volume) of the global Buffered Oxide Etch Market
(This release has been published on OMR Industry Journal. OMR Industry Journal is not responsible for any content included in this release.)
